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A combination of low pyrolysis temperatures (225-250\ndegreesC) and low solution concentrations (0.01-0.02 M) has resulted in\nthe formation of thin solid CuS films. At a pyrolysis temperature of\n275 degreesC Cu1.8S films have been obtained. The higher concentration\nrange (0.05-0.20 M) has been found favorable for simultaneous formation\nof Cu1.8S and CuS. In the two-phase layers the crystal growth of CuS\nhas seemed to be limited, whilst the growth of Cu1.8S has been\npreferentially favored especially on its (0 0 15) lattice plane. (C)\n2001 Elsevier Science Ltd. 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