TY - JOUR AU - Drevet, Richard AU - Souček, Pavel AU - Mareš, Pavel AU - Ondračka, Pavel AU - Dubau, Martin AU - Kolonits, Tamás AU - Czigány, Zsolt AU - Balázsi, Katalin AU - Vašina, Petr TI - Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications JF - VACUUM J2 - VACUUM VL - 221 PY - 2024 PG - 15 SN - 0042-207X DO - 10.1016/j.vacuum.2023.112881 UR - https://m2.mtmt.hu/api/publication/34445377 ID - 34445377 AB - This research aims at studying aluminum tantalum oxide thin films (AlxTayOz) deposited at low temperature for dielectric applications. These ternary oxide layers are synthesized at 180 °C by physical vapor deposition (PVD), specifically the mid-frequency pulsed direct current reactive magnetron sputtering. The deposition process uses targets made of a mixture of aluminum and tantalum in various proportions. Four target compositions are studied containing 95 at.%, 90 at.%, 80 at.%, and 70 at.% of aluminum, corresponding to 5 at.%, 10 at.%, 20 at.%, and 30 at.% of tantalum, respectively. The ternary oxide thin films of AlxTayOz are compared to aluminum oxide (AlxOz) and tantalum oxide (TayOz) layers produced in the same experimental conditions. The AlxTayOz thin films are dense, uniform, and amorphous regardless of the experimental conditions used in this study. Their chemical composition changes as a function of the target composition. The oxygen flow used during deposition also affects the chemical composition of the oxide layers and the deposition rate. The oxide thin films with tantalum are deposited at higher deposition rates and contain more oxygen. Tantalum also promotes the amorphization of the oxide layers. The highest dielectric strength is measured for the thin film containing a low amount of tantalum combined with a high amount of oxygen. LA - English DB - MTMT ER - TY - JOUR AU - Dravecz, Gabriella AU - Kolonits, Tamás AU - Péter, László TI - Formation of LiNbO3 Nanocrystals Using the Solvothermal Method JF - CRYSTALS J2 - CRYSTALS VL - 13 PY - 2023 IS - 1 PG - 10 SN - 2073-4352 DO - 10.3390/cryst13010077 UR - https://m2.mtmt.hu/api/publication/33543533 ID - 33543533 AB - The optimization of the parameters of the solvothermal synthesis of lithium niobate (LiNbO3, LN) nanocrystals from Nb2O5 and LiOH was performed. The effects of polyol media, reaction time and Li excess of the starting reagents were investigated. According to the X-ray diffraction phase analysis, Li3NbO4 and Nb2O5 were also detected besides the LN phase in many samples depending on the ratio of the starting components and the reaction time. The best yield and the most homogeneous LN phase was prepared by using diethylene glycol medium with a Li/Nb ratio of 1.5 and a 72 h reaction time. The size and the shape of the LN particles were characterized by scanning electron microscopy. The particle size distribution was narrow and under 100 nm for all cases. LA - English DB - MTMT ER - TY - JOUR AU - Gajdics, Marcell AU - Serényi, Miklós AU - Kolonits, Tamás AU - Sulyok, Attila AU - Horváth, Zsolt Endre AU - Pécz, Béla TI - Reactive Sputter Deposition of Ga2O3 Thin Films Using Liquid Ga Target JF - COATINGS J2 - COATINGS VL - 13 PY - 2023 IS - 9 PG - 11 SN - 2079-6412 DO - 10.3390/coatings13091550 UR - https://m2.mtmt.hu/api/publication/34126054 ID - 34126054 AB - Ga2O3 is a promising material in the optoelectronics and semiconductor industry. In this work, gallium oxide thin films were deposited via radio frequency (RF) sputtering, using a liquid Ga target. The reactive sputtering was carried out using different oxygen flow rates and DC target potentials induced via the RF power. The thickness of the samples varied between 160 nm and 460 nm, depending on the preparation conditions. The composition and the refractive index of the layers were investigated via energy-dispersive spectroscopy, X-ray photoelectron spectroscopy, and spectroscopic ellipsometry, respectively. It was found that, through the use of a lower DC target potential, a better film quality and higher oxygen content can be achieved. The reactive sputtering was modeled based on the Berg model, with the aim of determining the sputtering yields and the sticking coefficient. It was shown that an increase in DC target potential leads to the preferential sputtering of gallium. LA - English DB - MTMT ER - TY - CHAP AU - Kolonits, Tamás AU - Serényi, Miklós ED - Fried, Miklós TI - Detailing the problem of the analytical solution for the reflectivity of a double-layer coating deposited from different refractive indexes films T2 - Symposium on Materials Science 2022 PB - Óbudai Egyetem CY - Budapest SN - 9789634493204 PY - 2023 SP - 22 EP - 31 PG - 7 UR - https://m2.mtmt.hu/api/publication/33751711 ID - 33751711 LA - English DB - MTMT ER - TY - JOUR AU - Hegedüs, Nikolett AU - Balázsi, Csaba AU - Kolonits, Tamás AU - Olasz, Dániel AU - Sáfrán, György AU - Serényi, Miklós AU - Balázsi, Katalin TI - Investigation of the RF Sputtering Process and the Properties of Deposited Silicon Oxynitride Layers under Varying Reactive Gas Conditions JF - MATERIALS J2 - MATERIALS VL - 15 PY - 2022 IS - 18 PG - 14 SN - 1996-1944 DO - 10.3390/ma15186313 UR - https://m2.mtmt.hu/api/publication/33090439 ID - 33090439 AB - In a single process run, an amorphous silicon oxynitride layer was grown, which includes the entire transition from oxide to nitride. The variation of the optical properties and the thickness of the layer was characterized by Spectroscopic Ellipsometry (SE) measurements, while the elemental composition was investigated by Energy Dispersive Spectroscopy (EDS). It was revealed that the refractive index of the layer at 632.8 nm is tunable in the 1.48–1.89 range by varying the oxygen partial pressure in the chamber. From the data of the composition of the layer, the typical physical parameters of the process were determined by applying the Berg model valid for reactive sputtering. In our modelling, a new approach was introduced, where the metallic Si target sputtered with a uniform nitrogen and variable oxygen gas flow was considered as an oxygen gas-sputtered SiN target. The layer growth method used in the present work and the revealed correlations between sputtering parameters, layer composition and refractive index, enable both the achievement of the desired optical properties of silicon oxynitride layers and the production of thin films with gradient refractive index for technology applications. LA - English DB - MTMT ER - TY - JOUR AU - Kocsor, Laura AU - Kovács, László AU - Bencs, László AU - Kolonits, Tamás AU - Lengyel, Krisztián AU - Bazsó, Gábor AU - Kis, Zsolt AU - Péter, László TI - Lithium oxide loss of lithium niobate nanocrystals during high-energy ball-milling JF - JOURNAL OF ALLOYS AND COMPOUNDS J2 - J ALLOY COMPD VL - 909 PY - 2022 PG - 10 SN - 0925-8388 DO - 10.1016/j.jallcom.2022.164713 UR - https://m2.mtmt.hu/api/publication/32778844 ID - 32778844 LA - English DB - MTMT ER - TY - CHAP AU - Kolonits, Tamás AU - Gubicza, Jenő AU - Péter, László AU - Bakonyi, Imre AU - Czigány, Zsolt ED - Kittel, Ágnes ED - Solymosi, Katalin ED - Barna, László TI - Ciszteintartalmú elektrolitból leválasztott nikkel rétegek mikroszerkezete, keménysége és termikus stabilitása. Microstructure, hardness and thermal stability of nickel films electrodeposited from cysteine containing bath TS - Microstructure, hardness and thermal stability of nickel films electrodeposited from cysteine containing bath T2 - A Magyar Mikroszkópos Társaság 2022 Konferenciájának Kivonatkönyve PB - Magyar Mikroszkópos Társaság CY - Budapest SN - 9786158210706 PY - 2022 SP - 130 EP - 132 PG - 3 UR - https://m2.mtmt.hu/api/publication/33342411 ID - 33342411 LA - English DB - MTMT ER - TY - JOUR AU - Roper, Christopher M. AU - Heczel, Anita AU - Bhattiprolu, Venkata Satish AU - Kolonits, Tamás AU - Gubicza, Jenő AU - Brewer, Luke N. TI - Effect of laser heating on microstructure and deposition properties of cold sprayed SS304L JF - MATERIALIA J2 - MATERIALIA VL - 22 PY - 2022 PG - 10 SN - 2589-1529 DO - 10.1016/j.mtla.2022.101372 UR - https://m2.mtmt.hu/api/publication/32772699 ID - 32772699 N1 - Department of Metallurgical and Materials Engineering, The University of AlabamaAL 35487-0202, United States Department of Materials Physics, Eötvös Loránd University, Budapest, Hungary Cited By :1 Export Date: 29 January 2024 Correspondence Address: Roper, C.M.; Department of Metallurgical and Materials Engineering, United States; email: cmroper@crimson.ua.edu LA - English DB - MTMT ER - TY - THES AU - Kolonits, Tamás TI - Elektrokémiai úton leválasztott nikkel nanoszerkezetek kialakítása és jellemzése PB - ELTE PY - 2021 SP - 125 UR - https://m2.mtmt.hu/api/publication/32637585 ID - 32637585 LA - Hungarian DB - MTMT ER - TY - JOUR AU - El-Tahawy, Moustafa AU - Jenei, Péter AU - Kolonits, Tamás AU - Han, Gigap AU - Park, Hyeji AU - Choe, Heeman AU - Gubicza, Jenő TI - Different Evolutions of the Microstructure, Texture, and Mechanical Performance During Tension and Compression of 316L Stainless Steel JF - METALLURGICAL AND MATERIALS TRANSACTIONS A-PHYSICAL METALLURGY AND MATERIALS SCIENCE J2 - METALL MATER TRANS A VL - 51 PY - 2020 IS - 7 SP - 3447 EP - 3460 PG - 14 SN - 1073-5623 DO - 10.1007/s11661-020-05782-5 UR - https://m2.mtmt.hu/api/publication/31318665 ID - 31318665 LA - English DB - MTMT ER -