TY - JOUR AU - Balogh, Zoltán AU - Len, Adél AU - Baksa, Viktória AU - Krajnc, Andraž AU - Herman, Petra AU - Szemán-Nagy, Gábor AU - Czigány, Zsolt AU - Fábián, István AU - Kalmár, József AU - Dudás, Zoltán Imre TI - Nanoscale structural characteristics and in vitro bioactivity of borosilicate – polyvinyl alcohol (PVA) hybrid aerogels for bone regeneration JF - ACS APPLIED NANO MATERIALS J2 - ACS APPL NANO MATER VL - 7 PY - 2024 IS - 4 SP - 4092 EP - 4102 PG - 11 SN - 2574-0970 DO - 10.1021/acsanm.3c05668 UR - https://m2.mtmt.hu/api/publication/34538335 ID - 34538335 N1 - Export Date: 25 March 2024 LA - English DB - MTMT ER - TY - JOUR AU - Drevet, Richard AU - Souček, Pavel AU - Mareš, Pavel AU - Ondračka, Pavel AU - Dubau, Martin AU - Kolonits, Tamás AU - Czigány, Zsolt AU - Balázsi, Katalin AU - Vašina, Petr TI - Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications JF - VACUUM J2 - VACUUM VL - 221 PY - 2024 PG - 15 SN - 0042-207X DO - 10.1016/j.vacuum.2023.112881 UR - https://m2.mtmt.hu/api/publication/34445377 ID - 34445377 AB - This research aims at studying aluminum tantalum oxide thin films (AlxTayOz) deposited at low temperature for dielectric applications. These ternary oxide layers are synthesized at 180 °C by physical vapor deposition (PVD), specifically the mid-frequency pulsed direct current reactive magnetron sputtering. The deposition process uses targets made of a mixture of aluminum and tantalum in various proportions. Four target compositions are studied containing 95 at.%, 90 at.%, 80 at.%, and 70 at.% of aluminum, corresponding to 5 at.%, 10 at.%, 20 at.%, and 30 at.% of tantalum, respectively. The ternary oxide thin films of AlxTayOz are compared to aluminum oxide (AlxOz) and tantalum oxide (TayOz) layers produced in the same experimental conditions. The AlxTayOz thin films are dense, uniform, and amorphous regardless of the experimental conditions used in this study. Their chemical composition changes as a function of the target composition. The oxygen flow used during deposition also affects the chemical composition of the oxide layers and the deposition rate. The oxide thin films with tantalum are deposited at higher deposition rates and contain more oxygen. Tantalum also promotes the amorphization of the oxide layers. The highest dielectric strength is measured for the thin film containing a low amount of tantalum combined with a high amount of oxygen. LA - English DB - MTMT ER - TY - JOUR AU - Kovácsné Kis, Viktória AU - Kovács, Zsolt AU - Czigány, Zsolt TI - Improved Method for Electron Powder Diffraction-Based Rietveld Analysis of Nanomaterials JF - NANOMATERIALS J2 - NANOMATERIALS-BASEL VL - 14 PY - 2024 IS - 5 PG - 17 SN - 2079-4991 DO - 10.3390/nano14050444 UR - https://m2.mtmt.hu/api/publication/34699351 ID - 34699351 N1 - Export Date: 19 March 2024 Correspondence Address: Kis, V.K.; HUN-REN Centre for Energy Research, Konkoly-Thege Miklós út 29-33, Hungary; email: kis.viktoria@ek.hun-ren.hu Correspondence Address: Czigány, Z.; HUN-REN Centre for Energy Research, Konkoly-Thege Miklós út 29-33, Hungary; email: czigany.zsolt@ek.hun-ren.hu AB - Multiphase nanomaterials are of increasing importance in material science. Providing reliable and statistically meaningful information on their average nanostructure is essential for synthesis control and applications. In this paper, we propose a novel procedure that simplifies and makes more effective the electron powder diffraction-based Rietveld analysis of nanomaterials. Our single step in-TEM method allows to obtain the instrumental broadening function of the TEM directly from a single measurement without the need for an additional X-ray diffraction measurement. Using a multilayer graphene calibration standard and applying properly controlled acquisition conditions on a spherical aberration-corrected microscope, we achieved the instrumental broadening of ±0.01 Å in terms of interplanar spacing. The shape of the diffraction peaks is modeled as a function of the scattering angle using the Caglioti relation, and the obtained parameters for instrumental broadening can be directly applied in the Rietveld analysis of electron diffraction data of the analyzed specimen. During peak shape analysis, the instrumental broadening parameters of the TEM are controlled separately from nanostructure-related peak broadening effects, which contribute to the higher reliability of nanostructure information extracted from electron diffraction patterns. The potential of the proposed procedure is demonstrated through the Rietveld analysis of hematite nanopowder and two-component Cu-Ni nanocrystalline thin film specimens. LA - English DB - MTMT ER - TY - JOUR AU - Ženíšek, Jaroslav AU - Souček, Pavel AU - Ondračka, Pavel AU - Czigány, Zsolt AU - Buršíková, Vilma AU - Holec, David AU - Balázsi, Katalin AU - Vašina, Petr TI - Effect of Nb incorporation in Mo 2 BC coatings on structural and mechanical properties — Ab initio modelling and experiment JF - ACTA MATERIALIA J2 - ACTA MATER VL - 268 PY - 2024 PG - 12 SN - 1359-6454 DO - 10.1016/j.actamat.2024.119741 UR - https://m2.mtmt.hu/api/publication/34666828 ID - 34666828 LA - English DB - MTMT ER - TY - JOUR AU - Czene, Szabolcs AU - Jegenyés, Nikoletta AU - Homokiné Krafcsik, Olga AU - Lenk, Sándor AU - Czigány, Zsolt AU - Bortel, Gábor AU - Kamarás, Katalin AU - Rohonczy, János AU - Beke, Dávid AU - Gali, Ádám TI - Amino-Termination of Silicon Carbide Nanoparticles JF - NANOMATERIALS J2 - NANOMATERIALS-BASEL VL - 13 PY - 2023 IS - 13 PG - 17 SN - 2079-4991 DO - 10.3390/nano13131953 UR - https://m2.mtmt.hu/api/publication/34040657 ID - 34040657 AB - Silicon carbide nanoparticles (SiC NPs) are promising inorganic molecular-sized fluorescent biomarkers. It is imperative to develop methods to functionalize SiC NPs for certain biological applications. One possible route is to form amino groups on the surface, which can be readily used to attach target biomolecules. Here, we report direct amino-termination of aqueous SiC NPs. We demonstrate the applicability of the amino-terminated SiC NPs by attaching bovine serum albumin as a model for functionalization. We monitor the optical properties of the SiC NPs in this process and find that the fluorescence intensity is very sensitive to surface termination. Our finding may have implications for a few nanometers sized SiC NPs containing paramagnetic color centers with optically read electron spins. LA - English DB - MTMT ER - TY - BOOK ED - Czigány, Zsolt TI - Structure and Phase Transformations in Thin Films PB - MDPI CY - Basel PY - 2023 SP - 142 SN - 9783036587349 DO - 10.3390/books978-3-0365-8735-6 UR - https://m2.mtmt.hu/api/publication/34271393 ID - 34271393 LA - English DB - MTMT ER - TY - JOUR AU - Czigány, Zsolt TI - Structure and Phase Transformations in Thin Films JF - COATINGS J2 - COATINGS VL - 13 PY - 2023 IS - 7 PG - 4 SN - 2079-6412 DO - 10.3390/coatings13071233 UR - https://m2.mtmt.hu/api/publication/34060816 ID - 34060816 LA - English DB - MTMT ER - TY - JOUR AU - Czigány, Zsolt AU - Kovácsné Kis, Viktória TI - Acquisition and evaluation procedure to improve the accuracy of SAED JF - MICROSCOPY RESEARCH AND TECHNIQUE J2 - MICROSC RES TECHNIQ VL - 86 PY - 2023 IS - 2 SP - 144 EP - 156 PG - 13 SN - 1059-910X DO - 10.1002/jemt.24229 UR - https://m2.mtmt.hu/api/publication/33100907 ID - 33100907 LA - English DB - MTMT ER - TY - JOUR AU - Drevet, Richard AU - Souček, Pavel AU - Mareš, Pavel AU - Dubau, Martin AU - Czigány, Zsolt AU - Balázsi, Katalin AU - Vašina, Petr TI - Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications JF - VACUUM J2 - VACUUM VL - 210 PY - 2023 PG - 15 SN - 0042-207X DO - 10.1016/j.vacuum.2023.111870 UR - https://m2.mtmt.hu/api/publication/33599977 ID - 33599977 AB - This research describes the synthesis of multilayer thin films of aluminum oxide and tantalum oxide for dielectric applications. The multilayer thin films are made of two, four, or eight oxide layers produced by physical vapor deposition (PVD), specifically mid-frequency pulsed direct current magnetron sputtering. The oxide layers are stoichiometric Al2O3 and Ta2O5 with two specific morphologies observed from cross-section images obtained by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The Al2O3 layers exhibit a columnar structure whereas the Ta2O5 layers are uniform and dense. However, the morphology of the Ta2O5 layers changes progressively in the four-layer and eight-layer systems under the influence of the morphology of the Al2O3 layer below. This behavior is induced by the morphological continuity of the interface between two oxide layers. X-ray diffraction (XRD) shows the low crystallinity of these oxide layers due to the experimental conditions used during the magnetron sputtering process, particularly the low deposition temperature. The dielectric behavior of the multilayer thin films is studied by dielectric strength measurements. The results are compared to the values obtained for single layers of Al2O3 and Ta2O5 produced under the same experimental conditions. The two-layer system shows an intermediate value compared to the single layers, higher than Al2O3 and lower than Ta2O5. The dielectric strengths of the four-layer and the eight-layer systems are higher than those measured for the single layers of Al2O3 and Ta2O5. Finally, the morphology and the crystallinity of the multilayer thin films are changed by thermal annealing of these samples at 850 °C under vacuum. The thermal annealing induces crystallization of the Ta2O5 layers and the loss of morphological continuity at the interface between the oxide layers. These modifications result however in a lower dielectric strength for all the multilayer thin films. LA - English DB - MTMT ER - TY - JOUR AU - Kroker, Michael AU - Souček, Pavel AU - Zábranský, Lukáš AU - Buršíková, Vilma AU - Czigány, Zsolt AU - Sochora, Vjačeslav AU - Balázsi, Katalin AU - Jílek, Mojmír AU - Vašina, Petr TI - Industrially deposited hard and damage resistant W-B-C coatings JF - SURFACE AND COATINGS TECHNOLOGY J2 - SURF COAT TECH VL - 454 PY - 2023 PG - 12 SN - 0257-8972 DO - 10.1016/j.surfcoat.2022.129150 UR - https://m2.mtmt.hu/api/publication/33531138 ID - 33531138 LA - English DB - MTMT ER -