@article{MTMT:34538335, title = {Nanoscale structural characteristics and in vitro bioactivity of borosilicate – polyvinyl alcohol (PVA) hybrid aerogels for bone regeneration}, url = {https://m2.mtmt.hu/api/publication/34538335}, author = {Balogh, Zoltán and Len, Adél and Baksa, Viktória and Krajnc, Andraž and Herman, Petra and Szemán-Nagy, Gábor and Czigány, Zsolt and Fábián, István and Kalmár, József and Dudás, Zoltán Imre}, doi = {10.1021/acsanm.3c05668}, journal-iso = {ACS APPL NANO MATER}, journal = {ACS APPLIED NANO MATERIALS}, volume = {7}, unique-id = {34538335}, keywords = {Bone regeneration}, year = {2024}, eissn = {2574-0970}, pages = {4092-4102}, orcid-numbers = {Szemán-Nagy, Gábor/0000-0003-1906-0188; Czigány, Zsolt/0000-0001-6410-8801; Kalmár, József/0000-0002-2422-6106} } @article{MTMT:34445377, title = {Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications}, url = {https://m2.mtmt.hu/api/publication/34445377}, author = {Drevet, Richard and Souček, Pavel and Mareš, Pavel and Ondračka, Pavel and Dubau, Martin and Kolonits, Tamás and Czigány, Zsolt and Balázsi, Katalin and Vašina, Petr}, doi = {10.1016/j.vacuum.2023.112881}, journal-iso = {VACUUM}, journal = {VACUUM}, volume = {221}, unique-id = {34445377}, issn = {0042-207X}, abstract = {This research aims at studying aluminum tantalum oxide thin films (AlxTayOz) deposited at low temperature for dielectric applications. These ternary oxide layers are synthesized at 180 °C by physical vapor deposition (PVD), specifically the mid-frequency pulsed direct current reactive magnetron sputtering. The deposition process uses targets made of a mixture of aluminum and tantalum in various proportions. Four target compositions are studied containing 95 at.%, 90 at.%, 80 at.%, and 70 at.% of aluminum, corresponding to 5 at.%, 10 at.%, 20 at.%, and 30 at.% of tantalum, respectively. The ternary oxide thin films of AlxTayOz are compared to aluminum oxide (AlxOz) and tantalum oxide (TayOz) layers produced in the same experimental conditions. The AlxTayOz thin films are dense, uniform, and amorphous regardless of the experimental conditions used in this study. Their chemical composition changes as a function of the target composition. The oxygen flow used during deposition also affects the chemical composition of the oxide layers and the deposition rate. The oxide thin films with tantalum are deposited at higher deposition rates and contain more oxygen. Tantalum also promotes the amorphization of the oxide layers. The highest dielectric strength is measured for the thin film containing a low amount of tantalum combined with a high amount of oxygen.}, keywords = {ALUMINUM; Tantalum; Reactive magnetron sputtering; dielectric strength; Ternary oxide; dielectric breakdown}, year = {2024}, eissn = {1879-2715}, orcid-numbers = {Kolonits, Tamás/0000-0002-5836-4398; Czigány, Zsolt/0000-0001-6410-8801; Balázsi, Katalin/0000-0002-8929-9672} } @article{MTMT:34699351, title = {Improved Method for Electron Powder Diffraction-Based Rietveld Analysis of Nanomaterials}, url = {https://m2.mtmt.hu/api/publication/34699351}, author = {Kovácsné Kis, Viktória and Kovács, Zsolt and Czigány, Zsolt}, doi = {10.3390/nano14050444}, journal-iso = {NANOMATERIALS-BASEL}, journal = {NANOMATERIALS}, volume = {14}, unique-id = {34699351}, abstract = {Multiphase nanomaterials are of increasing importance in material science. Providing reliable and statistically meaningful information on their average nanostructure is essential for synthesis control and applications. In this paper, we propose a novel procedure that simplifies and makes more effective the electron powder diffraction-based Rietveld analysis of nanomaterials. Our single step in-TEM method allows to obtain the instrumental broadening function of the TEM directly from a single measurement without the need for an additional X-ray diffraction measurement. Using a multilayer graphene calibration standard and applying properly controlled acquisition conditions on a spherical aberration-corrected microscope, we achieved the instrumental broadening of ±0.01 Å in terms of interplanar spacing. The shape of the diffraction peaks is modeled as a function of the scattering angle using the Caglioti relation, and the obtained parameters for instrumental broadening can be directly applied in the Rietveld analysis of electron diffraction data of the analyzed specimen. During peak shape analysis, the instrumental broadening parameters of the TEM are controlled separately from nanostructure-related peak broadening effects, which contribute to the higher reliability of nanostructure information extracted from electron diffraction patterns. The potential of the proposed procedure is demonstrated through the Rietveld analysis of hematite nanopowder and two-component Cu-Ni nanocrystalline thin film specimens.}, keywords = {electron diffraction; Nanopowder; Rietveld analysis; nanostructure characterization; instrumental broadening}, year = {2024}, eissn = {2079-4991}, orcid-numbers = {Kovács, Zsolt/0000-0001-6802-3311; Czigány, Zsolt/0000-0001-6410-8801} } @article{MTMT:34666828, title = {Effect of Nb incorporation in Mo 2 BC coatings on structural and mechanical properties — Ab initio modelling and experiment}, url = {https://m2.mtmt.hu/api/publication/34666828}, author = {Ženíšek, Jaroslav and Souček, Pavel and Ondračka, Pavel and Czigány, Zsolt and Buršíková, Vilma and Holec, David and Balázsi, Katalin and Vašina, Petr}, doi = {10.1016/j.actamat.2024.119741}, journal-iso = {ACTA MATER}, journal = {ACTA MATERIALIA}, volume = {268}, unique-id = {34666828}, issn = {1359-6454}, year = {2024}, eissn = {1873-2453}, orcid-numbers = {Souček, Pavel/0000-0001-8115-7576; Ondračka, Pavel/0000-0003-0729-629X; Czigány, Zsolt/0000-0001-6410-8801; Balázsi, Katalin/0000-0002-8929-9672; Vašina, Petr/0000-0001-8128-4145} } @article{MTMT:34040657, title = {Amino-Termination of Silicon Carbide Nanoparticles}, url = {https://m2.mtmt.hu/api/publication/34040657}, author = {Czene, Szabolcs and Jegenyés, Nikoletta and Homokiné Krafcsik, Olga and Lenk, Sándor and Czigány, Zsolt and Bortel, Gábor and Kamarás, Katalin and Rohonczy, János and Beke, Dávid and Gali, Ádám}, doi = {10.3390/nano13131953}, journal-iso = {NANOMATERIALS-BASEL}, journal = {NANOMATERIALS}, volume = {13}, unique-id = {34040657}, abstract = {Silicon carbide nanoparticles (SiC NPs) are promising inorganic molecular-sized fluorescent biomarkers. It is imperative to develop methods to functionalize SiC NPs for certain biological applications. One possible route is to form amino groups on the surface, which can be readily used to attach target biomolecules. Here, we report direct amino-termination of aqueous SiC NPs. We demonstrate the applicability of the amino-terminated SiC NPs by attaching bovine serum albumin as a model for functionalization. We monitor the optical properties of the SiC NPs in this process and find that the fluorescence intensity is very sensitive to surface termination. Our finding may have implications for a few nanometers sized SiC NPs containing paramagnetic color centers with optically read electron spins.}, keywords = {NANOPARTICLES; silicon carbide; FUNCTIONALIZATION; BSA; bioimaging}, year = {2023}, eissn = {2079-4991}, orcid-numbers = {Lenk, Sándor/0000-0002-7207-0329; Czigány, Zsolt/0000-0001-6410-8801; Kamarás, Katalin/0000-0002-0390-3331; Rohonczy, János/0000-0003-2539-3640; Gali, Ádám/0000-0002-3339-5470} } @book{MTMT:34271393, title = {Structure and Phase Transformations in Thin Films}, url = {https://m2.mtmt.hu/api/publication/34271393}, isbn = {9783036587356}, doi = {10.3390/books978-3-0365-8735-6}, editor = {Czigány, Zsolt}, publisher = {MDPI AG}, unique-id = {34271393}, year = {2023}, orcid-numbers = {Czigány, Zsolt/0000-0001-6410-8801} } @article{MTMT:34060816, title = {Structure and Phase Transformations in Thin Films}, url = {https://m2.mtmt.hu/api/publication/34060816}, author = {Czigány, Zsolt}, doi = {10.3390/coatings13071233}, journal-iso = {COATINGS}, journal = {COATINGS}, volume = {13}, unique-id = {34060816}, issn = {2079-6412}, year = {2023}, eissn = {2079-6412}, orcid-numbers = {Czigány, Zsolt/0000-0001-6410-8801} } @article{MTMT:33100907, title = {Acquisition and evaluation procedure to improve the accuracy of SAED}, url = {https://m2.mtmt.hu/api/publication/33100907}, author = {Czigány, Zsolt and Kovácsné Kis, Viktória}, doi = {10.1002/jemt.24229}, journal-iso = {MICROSC RES TECHNIQ}, journal = {MICROSCOPY RESEARCH AND TECHNIQUE}, volume = {86}, unique-id = {33100907}, issn = {1059-910X}, year = {2023}, eissn = {1097-0029}, pages = {144-156}, orcid-numbers = {Czigány, Zsolt/0000-0001-6410-8801} } @article{MTMT:33599977, title = {Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications}, url = {https://m2.mtmt.hu/api/publication/33599977}, author = {Drevet, Richard and Souček, Pavel and Mareš, Pavel and Dubau, Martin and Czigány, Zsolt and Balázsi, Katalin and Vašina, Petr}, doi = {10.1016/j.vacuum.2023.111870}, journal-iso = {VACUUM}, journal = {VACUUM}, volume = {210}, unique-id = {33599977}, issn = {0042-207X}, abstract = {This research describes the synthesis of multilayer thin films of aluminum oxide and tantalum oxide for dielectric applications. The multilayer thin films are made of two, four, or eight oxide layers produced by physical vapor deposition (PVD), specifically mid-frequency pulsed direct current magnetron sputtering. The oxide layers are stoichiometric Al2O3 and Ta2O5 with two specific morphologies observed from cross-section images obtained by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The Al2O3 layers exhibit a columnar structure whereas the Ta2O5 layers are uniform and dense. However, the morphology of the Ta2O5 layers changes progressively in the four-layer and eight-layer systems under the influence of the morphology of the Al2O3 layer below. This behavior is induced by the morphological continuity of the interface between two oxide layers. X-ray diffraction (XRD) shows the low crystallinity of these oxide layers due to the experimental conditions used during the magnetron sputtering process, particularly the low deposition temperature. The dielectric behavior of the multilayer thin films is studied by dielectric strength measurements. The results are compared to the values obtained for single layers of Al2O3 and Ta2O5 produced under the same experimental conditions. The two-layer system shows an intermediate value compared to the single layers, higher than Al2O3 and lower than Ta2O5. The dielectric strengths of the four-layer and the eight-layer systems are higher than those measured for the single layers of Al2O3 and Ta2O5. Finally, the morphology and the crystallinity of the multilayer thin films are changed by thermal annealing of these samples at 850 °C under vacuum. The thermal annealing induces crystallization of the Ta2O5 layers and the loss of morphological continuity at the interface between the oxide layers. These modifications result however in a lower dielectric strength for all the multilayer thin films.}, keywords = {Aluminum Oxide; Reactive magnetron sputtering; Multilayer thin films; Tantalum oxide; dielectric strength; dielectric breakdown}, year = {2023}, eissn = {1879-2715}, orcid-numbers = {Czigány, Zsolt/0000-0001-6410-8801; Balázsi, Katalin/0000-0002-8929-9672} } @article{MTMT:33531138, title = {Industrially deposited hard and damage resistant W-B-C coatings}, url = {https://m2.mtmt.hu/api/publication/33531138}, author = {Kroker, Michael and Souček, Pavel and Zábranský, Lukáš and Buršíková, Vilma and Czigány, Zsolt and Sochora, Vjačeslav and Balázsi, Katalin and Jílek, Mojmír and Vašina, Petr}, doi = {10.1016/j.surfcoat.2022.129150}, journal-iso = {SURF COAT TECH}, journal = {SURFACE AND COATINGS TECHNOLOGY}, volume = {454}, unique-id = {33531138}, issn = {0257-8972}, year = {2023}, eissn = {1879-3347}, orcid-numbers = {Kroker, Michael/0000-0002-3676-8607; Czigány, Zsolt/0000-0001-6410-8801; Balázsi, Katalin/0000-0002-8929-9672; Vašina, Petr/0000-0001-8128-4145} }