Effect of Electromigration in Tin-Bismuth and SAC Lead-Free Solder Joints of 0402 and 0201 Chip Resistors

Tafferner, Zoltán [Tafferner, Zoltán (elektronika és el...), szerző] Elektronikai Technológia Tanszék (BME / VIK); Havellant, Gergő [Havellant, Gergő (SMT, Gőzfázisú fo...), szerző] Elektronikai Technológia Tanszék (BME / VIK); Krammer, Olivér [Krammer, Olivér (Elektronikai tech...), szerző] Elektronikai Technológia Tanszék (BME / VIK); Illés, Balázs [Illés, Balázs György (Forrasztás, termi...), szerző] Elektronikai Technológia Tanszék (BME / VIK); Hurtony, Tamás [Hurtony, Tamás József (Elektronikai tech...), szerző] Elektronikai Technológia Tanszék (BME / VIK); Géczy, Attila [Géczy, Attila (Elektronikai tech...), szerző] Elektronikai Technológia Tanszék (BME / VIK)

Angol nyelvű Konferenciaközlemény (Könyvrészlet) Tudományos
    Miniaturization of devices leads to the appearance of high current densities inside solder joints. These current densities may induce electromigration, which can lead to the formation of thicker IMC layers, voids and Cu dissolution. In the case of Sn-Bi solders it may lead to phase segregation as well. Test vehicles for the study of solder joints of 0402 and 0201 chip resistors have been designed and realised on RO4350B high performance PCB dielectric material. The PCBs have been populated with zero ohm (jumper) 0402 and 0201 surface mounted chip-size resistors, using Sn-Bi and SAC solder, allowing for a direct comparison of the electromigration behaviour of the two solder types in the case of common component types. A test environment for high-current stressing was prepared. The samples were examined after reflowing and after 500 h of current stress, by shear testing and SEM crosssectional images. The microstructure of the samples was analysed to inspect void growth, IMC growth and Bi-layer aggregation behaviour. Besides the test samples taken out at 500 h aging, the test will continue until 4000 h total stress time, with additional analysis at the 1000h and 2000 h mark.
    Hivatkozás stílusok: IEEEACMAPAChicagoHarvardCSLMásolásNyomtatás
    2026-05-21 22:14