Generation of dielectric barrier discharge using carbon nanotube sheets as an electrode under high-density fluids including high pressure gases, supercritical fluids, and liquids

Muneoka, Hitoshi ✉; Ohta, Riichiro; Stauss, Sven; Terashima, Kazuo

Angol nyelvű Tudományos Szakcikk (Folyóiratcikk)
Megjelent: PLASMA SOURCES SCIENCE & TECHNOLOGY 0963-0252 1361-6595 28 (7) Paper: 075014 , 13 p. 2019
  • SJR Scopus - Condensed Matter Physics: Q1
    A stable plasma source for high-density fluids, i.e. liquids, supercritical fluids (SCFs), and high-pressure gases, was developed by utilizing carbon nanotube (CNT) sheets that possess a high supply capability for field electron emission. Discharges could be generated in high density N-2 and Ar on glassy carbon (GC) electrodes covered by CNT sheets (CNT electrodes), but not on bare GC electrodes. The similarity of the discharge characteristics with those reported by previous studies implies that the discharges in these high density fluids on the CNT electrodes were driven by field electron emission. The plasma produced in the high density N-2 is strongly suggested to comprise high-density metastable molecules reacting with the dielectric aluminoborosilicate glass, which causes the auroral emission of atomic oxygen lines in the optical emission spectrum. Although the discharge of N-2 or Ar gas under atmospheric pressure at room temperature destroyed the CNT sheets in terms of visual appearance, the discharges under the higher density conditions of high pressure gas, SCF, and their liquids, did not cause any observable damage to the CNT sheets. Following the exposure to discharges under several high density conditions of N-2, the chemical changes in the CNT electrodes were investigated using x-ray photoelectron spectroscopy (XPS). The results of the XPS analysis revealed that few chemical changes were caused in the electrodes by the exposure to discharges under the high pressure N-2 gas and gas-like N-2 SCF, whereas the discharge in the liquid-like SCF oxidized the CNT sheets.
    Hivatkozás stílusok: IEEEACMAPAChicagoHarvardCSLMásolásNyomtatás
    2020-10-02 01:01