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Advances in Resist Materials and Processing Technology XXVII

Somervell, MH [ed.]; Allen, RD [ed.]

English Conference proceedings (Book) Scientific

Published: International Society for Optics and Photonics (SPIE), Bellingham (WA), United States of America 2010

Conference: Advances in Resist Materials and Processing Technology XXVII 2010-02-22 [San Jose (CA), United States of America]

Series: Proceedings of SPIE 0277-786X 1996-756X, 7639

Identifiers

MTMT: 30087469
ISBN: 9780819480538

Chapters

Constantoudis V et al. Evolution of resist roughness during development: Stochastic simulation and dynamic scaling analysis. (2010) In: Advances in Resist Materials and Processing Technology XXVII
Schwartz Evan L. et al. New self-assembly strategies for next generation lithography. (2010) In: Advances in Resist Materials and Processing Technology XXVII

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2025-04-10 17:29

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