The phonsistor - a novel VO2 based nanoscale thermal-electronic device and its application in thermal-electronic logic circuits (TELC)

J, Mizsei [Mizsei, János (Félvezető eszközö...), szerző] Elektronikus Eszközök Tanszéke (BME / VIK); Marton, C Bein [Bein, Márton (Villamosmérnök), szerző] Elektronikus Eszközök Tanszéke (BME / VIK); J, Lappalainen; L, Juhász [Juhász, László (Elektronikus eszk...), szerző] Elektronikus Eszközök Tanszéke (BME / VIK); B, Plesz [Plesz, Balázs (Mikroelektronika,...), szerző] Elektronikus Eszközök Tanszéke (BME / VIK)

Angol nyelvű Absztrakt / Kivonat (Egyéb konferenciaközlemény) Tudományos
    Azonosítók
    • MTMT: 2811805
    Until now, the continuous development of electronics has been characterized by Moore’s law. The scale down resulted in the nanosized CMOS integrated circuits, pushing the “red brick wall” towards the lower dimensions. Although the current CMOS integrated circuit development is driven by a lot of innovations, there are still some limits determined by unavoidable physical effects such as tunneling of charge carriers through thin insulating regions and statistical irregularities in the number of dopant atoms. On the other hand, there are many new ideas for building atomic or molecular scale devices for the information technology. However, there is still a gap between the up-to-date “top-down” CMOS technology and the “bottom-up” devices, i.e. molecular electronics, nanotubes, single electron transistors. A new functional thermal-electronic device (phonsistor) and the CMOS compatible thermal-electronic logic circuit (TELC) [1,2] may help to fill this gap. The operation of these functional devices is based on the semiconductor-metal transition (SMT) effect shown by certain materials, for example VO2. This effect allows an electric resistance change in three to four orders of magnitude induced by thermal or electrical excitation. [3] The recently proposed novel active device (phonon transistor = phonsistor) is made up of only bulk type semiconductor domains, consisting of significantly less regions, interfaces, and providing advanced functionality compared to a monolithic MOSFET (there are no differently doped regions, p-n junctions at all). This way the single switches can be processed in steps that are technologically less demanding and fewer in number. The switches in the thermal-electronic logic circuit (TELC) can be excited by electronic and thermal signals as well, thus two different physical parameters are available for representing the different logic states. This is similar to neurons in the nervous system, where information is transmitted by different mechanisms for short and long distances and allows the realization of more complex logical connections as well as modeling of data processing in nervous systems. Due to its simple structure and process technology the TELC can be built as real 3D structure and can be made compatible with current CMOS technology enabling a smooth transition between the two integrated circuit concepts. With its extended logical functionality, TELC represent a higher level of integration that can be achieved with currently available technology. If scaled down to nanosize, the heat is distributed not only by diffusion, as it is characteristic for macro­scopic structures. Quantum and hot electron effects enable the device to operate faster than current CMOS switches. SMT properties of VO2 have been demonstrated down to 10 nm crystal size [4], thus scale down will be possible at least to this device size. The presentation will introduce the application of the SMT properties of vanadium dioxide in a novel thermal-electronic switching device called phonsistor, the operational principles of the phonsistor and the integration possibilities into logic circuits. A proof of concept for the device operation will be demonstrated. Further development, device scaling and integration issues will be discussed. References [1]J. Mizsei, J. Lappalainen, and M.C. Bein, “Thermal-electronic integrated logic,” in Thermal Investigations of ICs and Systems (THERMINIC), 2013 19th International Workshop on, pp. 128–134, Sept. 2011. [2]J. Mizsei and J. Lappalainen, “Logic arrangement,” WIPO/ PCT Patent WO2013/160709 A2, Oct. 31, 2013. [3]A. Zylbersztejn and N.F. Mott, “Metal-insulator transition in vanadium dioxide,” Phys. Rev. B, vol. 11, no. 11, pp. 4383–4395, Jun. 1975. [4]J. Nag and R.F. Haglund, “Synthesis of vanadium dioxide thin films and nanoparticles,” J. Phys.: Condens. Matter, vol. 20, no. 26, p. 264016, Jun. 2008.
    Hivatkozás stílusok: IEEEACMAPAChicagoHarvardCSLMásolásNyomtatás
    2026-02-18 15:38