Kinetically assisted potential sputtering of insulators by highly charged ions

Hayderer, G; Cernusca, S; Schmid, M; Varga, P; Winter, HP; Aumayr, F; Niemann, D; Hoffmann, V; Stolterfoht, N; Lemell, C; Wirtz, L; Burgdorfer, J [Burgdörfer, Joachim (Elméleti fizika), szerző]

Angol nyelvű Tudományos Szakcikk (Folyóiratcikk)
Megjelent: PHYSICAL REVIEW LETTERS 0031-9007 1079-7114 86 (16) pp. 3530-3533 2001
  • SJR Scopus - Physics and Astronomy (miscellaneous): D1
A new form of potential sputtering has been found for impact of slow (less than or equal to 1500 eV) multiply charged Xe ions (charge states up to q = 25) on MgOx. In contrast to alkali-halide or SiO2 surfaces this mechanism requires the simultaneous presence of electronic excitation of the target material and of a kinetically formed collision cascade within the target in order to initiate the sputtering process. This kinetically assisted potential sputtering mechanism has been identified to be present for ether insulating surfaces as well.
Hivatkozás stílusok: IEEEACMAPAChicagoHarvardCSLMásolásNyomtatás
2022-01-17 21:26